Invention Grant
- Patent Title: Exhaust system
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Application No.: US14682274Application Date: 2015-04-09
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Publication No.: US09702285B2Publication Date: 2017-07-11
- Inventor: Kiyoto Hayashi
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2014-087096 20140421; JP2015-035795 20150225
- Main IPC: B01D45/00
- IPC: B01D45/00 ; F01N3/08 ; H01J37/32 ; B01D45/08 ; H01L21/67 ; C23C16/44

Abstract:
An exhaust system connected to an exhaust port of a substrate processing apparatus includes: a first exhaust trap having an exhaust input at an upper portion thereof and an exhaust output at a lower portion thereof and cooling a product produced in the substrate processing apparatus; a second exhaust trap installed at a downstream side of an exhaust flow with respect to the first exhaust trap, having an exhaust input at a lower portion thereof and an exhaust output at an upper portion thereof, and cooling the product; a storage unit installed between the first and second exhaust traps and storing the product cooled by the first and second exhaust traps; a first pipe connecting the exhaust port of the substrate processing apparatus and the first exhaust trap; and a second pipe connecting the first exhaust trap, the second exhaust trap and the storage unit.
Public/Granted literature
- US20150300227A1 EXHAUST SYSTEM Public/Granted day:2015-10-22
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