Invention Grant
- Patent Title: Refractory walls, and gasification devices and methods
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Application No.: US13037968Application Date: 2011-03-01
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Publication No.: US09702628B2Publication Date: 2017-07-11
- Inventor: Wei Chen , Honghai Dong , Zhaohui Yang , Minggang She , Lishun Hu , Ke Liu , Xianglong Zhao
- Applicant: Wei Chen , Honghai Dong , Zhaohui Yang , Minggang She , Lishun Hu , Ke Liu , Xianglong Zhao
- Applicant Address: US NY Schenectady
- Assignee: GENERAL ELECTRIC COMPANY
- Current Assignee: GENERAL ELECTRIC COMPANY
- Current Assignee Address: US NY Schenectady
- Agency: GE Global Patent Operation
- Agent Peter T. DiMauro
- Priority: CN201010137013 20100329
- Main IPC: B01J7/00
- IPC: B01J7/00 ; F27D1/00 ; C10J3/48 ; C10J3/74 ; C10J3/52 ; C10J3/76 ; C10J3/84
Abstract:
A refractory wall comprises a hotface layer comprising a hotface surface configured to be adjacent to a carbonaceous gasification environment, a backing layer facing the hotface layer, and a cooling layer facing the backing layer and configured to cool the hotface layer via the backing layer. A gasification device and a gasification process are also presented.
Public/Granted literature
- US20120222354A1 REFRACTORY WALLS, AND GASIFICATION DEVICES AND METHODS Public/Granted day:2012-09-06
Information query
