Use of a full width array imaging sensor to measure real time film thicknesses on film manufacturing equipment
Abstract:
A method for providing film-thickness analysis with a spectrophotometer includes configuring an illuminator to emit a light beam at a film deposited on a substrate surface, configuring a linear sensor to receive light reflecting off the deposited film on the substrate surface via a gradient index lens and a linear variable filter, and configuring a processor to determine thickness of the film based on spectral reflectivity of the film received from the linear sensor.
Information query
Patent Agency Ranking
0/0