Provided is a silicon-based electro-optic modulator which is small in size and capable of high speed operation. A first silicon semiconductor layer (120) doped to exhibit a first type of conductivity and a second semiconductor layer (160) doped to exhibit a second type of conductivity are at least partly stacked together, and a relatively thin dielectric (150) is formed at the interface between the stacked first and second silicon semiconductor layers (120, 160). The first silicon semiconductor layer (120) has a rib waveguide shape (130) comprising a rib portion (131) and slab portions (132). A first heavily doped region (140) formed by a high concentration doping process is arranged at a location, in the first silicon semiconductor layer (120), neighboring to each of the slab portions (132). The first heavily doped region (140) has almost the same height as that of the rib portion (131) of the rib waveguide (130).