Invention Grant
- Patent Title: Pellicle and EUV exposure device comprising same
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Application No.: US14893314Application Date: 2014-05-20
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Publication No.: US09703187B2Publication Date: 2017-07-11
- Inventor: Yosuke Ono , Kazuo Kohmura
- Applicant: MITSUI CHEMICALS, INC.
- Applicant Address: JP Tokyo
- Assignee: MITSUI CHEMICALS, INC.
- Current Assignee: MITSUI CHEMICALS, INC.
- Current Assignee Address: JP Tokyo
- Agency: Buchanan, Ingersoll & Rooney PC
- Priority: JP2013-110042 20130524; JP2013-204242 20130930
- International Application: PCT/JP2014/002642 WO 20140520
- International Announcement: WO2014/188710 WO 20141127
- Main IPC: G03F1/62
- IPC: G03F1/62 ; G03F1/24 ; G03F7/20

Abstract:
The present invention addresses the problem of providing a pellicle which has high EUV transmittance and high strength, while being not susceptible to damage by heat. In order to solve the above-mentioned problem, the present invention provides a pellicle which comprises a pellicle film that has a refractive index (n) of light having a wavelength of 550 nm of 1.9-5.0 and a pellicle frame to which the pellicle film is bonded. The pellicle film has a composition that contains 30-100% by mole of carbon and 0-30% by mole of hydrogen. The intensity ratio of the 2D-band to the G-band, namely (intensity in 2D-band)/(intensity in G-band) is 1 or less, or alternatively, the intensity in the 2D-band and the intensity in the G-band are 0 in the Raman spectrum of the pellicle film.
Public/Granted literature
- US20160147141A1 PELLICLE AND EUV EXPOSURE DEVICE COMPRISING SAME Public/Granted day:2016-05-26
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