Invention Grant
- Patent Title: Nanotube structure based metal damascene process
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Application No.: US14836978Application Date: 2015-08-27
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Publication No.: US09704800B2Publication Date: 2017-07-11
- Inventor: Ravi Joshi , Juergen Steinbrenner
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee Address: DE Neubiberg
- Agency: Viering, Jentschura & Partner mbB
- Main IPC: H01L23/532
- IPC: H01L23/532 ; H01L23/528 ; H01L21/02 ; H01L21/768 ; H01L21/285 ; H01L21/311

Abstract:
In various embodiments a method for manufacturing a metallization layer on a substrate is provided, wherein the method may include forming a plurality of groups of nanotubes over a substrate, wherein the groups of nanotubes may be arranged such that a portion of the substrate is exposed and forming metal over the exposed portion of the substrate between the plurality of groups of nanotubes.
Public/Granted literature
- US20150371942A1 NANOTUBE STRUCTURE BASED METAL DAMASCENE PROCESS Public/Granted day:2015-12-24
Information query
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