Invention Grant
- Patent Title: Methods for linewidth modification and apparatus implementing the same
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Application No.: US14875570Application Date: 2015-10-05
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Publication No.: US09704845B2Publication Date: 2017-07-11
- Inventor: Michael C. Smayling , Scott T. Becker
- Applicant: Tela Innovations, Inc.
- Applicant Address: US CA Los Gatos
- Assignee: Tela Innovations, Inc.
- Current Assignee: Tela Innovations, Inc.
- Current Assignee Address: US CA Los Gatos
- Agency: Martine Penilla Group LLP
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L23/528 ; H01L21/033 ; H01L21/3213 ; H01L21/8234 ; H01L29/423
Abstract:
A linear-shaped core structure of a first material is formed on an underlying material. A layer of a second material is conformally deposited over the linear-shaped core structure and exposed portions of the underlying material. The layer of the second material is etched so as to leave a filament of the second material on each sidewall of the linear-shaped core structure, and so as to remove the second material from the underlying material. The linear-shaped core structure of the first material is removed so as to leave each filament of the second material on the underlying material. Each filament of the second material provides a mask for etching the underlying material. Each filament of the second material can be selectively etched further to adjust its size, and to correspondingly adjust a size of a feature to be formed in the underlying material.
Public/Granted literature
- US20160027770A1 Methods for Linewidth Modification and Apparatus Implementing the Same Public/Granted day:2016-01-28
Information query
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