Invention Grant
- Patent Title: Dual-layer dielectric in memory device
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Application No.: US14998194Application Date: 2015-12-23
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Publication No.: US09704923B1Publication Date: 2017-07-11
- Inventor: Michael J. Bernhardt , Yudong Kim , Denzil S. Frost , Tuman Earl Allen, III , Kevin Lee Baker , Kolya Yastrebenetsky , Ronald Allen Weimer
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L23/528 ; H01L23/532 ; H01L21/768 ; H01L21/311 ; H01L23/00 ; H01L23/522 ; H01L27/105

Abstract:
Embodiments of the present disclosure describe techniques and configurations for a memory device comprising a memory array having a plurality of wordlines disposed in a memory region of a die. Fill regions may be disposed between respective pairs of adjacent wordlines of the plurality of wordlines. The fill regions may include a first dielectric layer and a second dielectric layer disposed on the first dielectric layer. The first dielectric layer may comprise organic (e.g., carbon-based) spin-on dielectric material (CSOD). The second dielectric layer may comprise a different dielectric material than the first dielectric layer, such as, for example, inorganic dielectric material. Other embodiments may be described and/or claimed.
Public/Granted literature
- US20170186815A1 Dual-layer dielectric in memory device Public/Granted day:2017-06-29
Information query
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