- Patent Title: Slurry for chemical-mechanical polishing of metals and use thereof
-
Application No.: US14733235Application Date: 2015-06-08
-
Publication No.: US09708508B2Publication Date: 2017-07-18
- Inventor: Graham M. Bates , Michael T. Brigham , Joseph K. Comeau , Jason P. Ritter , Matthew T. Tiersch , Eva A. Shah , Eric J. White
- Applicant: GLOBALFOUNDRIES INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Thompson Hine LLP
- Agent Anthony Canale
- Main IPC: H01L21/461
- IPC: H01L21/461 ; C09G1/04 ; H01L21/321 ; C09G1/02 ; C09K3/14 ; H01L21/768 ; C11D11/00
Abstract:
A composition and a method for chemical mechanical polishing. The composition includes a surfactant anion an alkyl alcohol and a diluent. The composition further includes abrasive particles and an oxidizer. The method includes providing the composition on a surface to be polished and polishing the surface by contacting the surface with a polishing pad.
Public/Granted literature
- US20150267084A1 SLURRY FOR CHEMICAL-MECHANICAL POLISHING OF METALS AND USE THEREOF Public/Granted day:2015-09-24
Information query
IPC分类:
