Invention Grant
- Patent Title: PVD apparatus and method with deposition chamber having multiple targets and magnets
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Application No.: US13307242Application Date: 2011-11-30
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Publication No.: US09708706B2Publication Date: 2017-07-18
- Inventor: Chung-En Kao , Ming-Chin Tsai , You-Hua Chou , Chen-Chia Chiang , Chih-Tsung Lee , Ming-Shiou Kuo
- Applicant: Chung-En Kao , Ming-Chin Tsai , You-Hua Chou , Chen-Chia Chiang , Chih-Tsung Lee , Ming-Shiou Kuo
- Applicant Address: TW Hsin-chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-chu
- Agency: Duane Morris LLP
- Main IPC: C23C14/35
- IPC: C23C14/35 ; H01J37/34
Abstract:
A thin film deposition system and method provide for multiple target assemblies that may be separately powered. Each target assembly includes a target and associated magnet or set of magnets. The disclosure provides a tunable film profile produced by multiple power sources that separately power the target arrangements. The relative amounts of power supplied to the target arrangements may be customized to provide a desired film and may be varied in time to produce a film with varied characteristics.
Public/Granted literature
- US20130136873A1 APPARATUS AND METHOD WITH DEPOSITION CHAMBER HAVING MULTIPLE TARGETS AND MAGNETS Public/Granted day:2013-05-30
Information query
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