• Patent Title: Atomic layer deposition method for coating a substrate surface using successive surface reactions with multiple precursors
  • Application No.: US14900816
    Application Date: 2014-06-26
  • Publication No.: US09708710B2
    Publication Date: 2017-07-18
  • Inventor: Tapani AlasaarelaPekka Soininen
  • Applicant: BENEQ OY
  • Applicant Address: FI Espoo
  • Assignee: BENEQ OY
  • Current Assignee: BENEQ OY
  • Current Assignee Address: FI Espoo
  • Agency: Eversheds Sutherland (US) LLP
  • Priority: FI20135707 20130627
  • International Application: PCT/FI2014/050527 WO 20140626
  • International Announcement: WO2014/207316 WO 20141231
  • Main IPC: C23C16/455
  • IPC: C23C16/455 C23C16/04 C23C16/54
Atomic layer deposition method for coating a substrate surface using successive surface reactions with multiple precursors
Abstract:
Methods for providing one or more coating layers on a surface of a substrate by successive surface reactions of at least a first and second precursor are provided. The methods generally include supplying the first precursor from a first precursor nozzle and the second precursor from a second precursor nozzle to the surface of the substrate, and moving the substrate relative to at least one of the first and second precursor nozzle. The methods can further include subjecting only one or more first limited sub-areas of the surface of the substrate to the first and second precursor by cooperation of supplying the first and second precursor and simultaneously moving the substrate relative to at least one of the first and second precursor nozzle.
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