Invention Grant
- Patent Title: Curved face diffraction grating fabrication method, curved face diffraction grating cast, and curved face diffraction grating employing same
-
Application No.: US14406168Application Date: 2013-06-03
-
Publication No.: US09709714B2Publication Date: 2017-07-18
- Inventor: Takanori Aono , Yoshisada Ebata , Shigeru Matsui , Tetsuya Watanabe , Yugo Onoda
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- Priority: JP2012-130354 20120608; JP2013-001829 20130109
- International Application: PCT/JP2013/065398 WO 20130603
- International Announcement: WO2013/183601 WO 20131212
- Main IPC: G02B5/18
- IPC: G02B5/18 ; B32B37/24 ; B32B38/00 ; B32B37/12 ; B29C59/02

Abstract:
A curved surface diffraction grating fabrication method for fabricating a curved surface diffraction grating having a desired curvature with high accuracy, includes: a step of forming a diffraction grating pattern on a flat-shaped silicon substrate; a step of curving the silicon substrate on which the diffraction grating pattern is formed, by pressing, in a heated state, a fixing substrate having a shape with a desired curved surface onto the silicon substrate and of fixing the silicon substrate on which the diffraction grating pattern is formed to the fixing substrate having the shape with the curved surface, to fabricate a curved surface diffraction grating cast; and a step of bringing a member having flexibility into contact with the curved surface diffraction grating cast, to transfer the diffraction grating pattern to the member.
Public/Granted literature
Information query