- Patent Title: Optical element and device for generating an optical line pattern
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Application No.: US15094068Application Date: 2016-04-08
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Publication No.: US09709784B2Publication Date: 2017-07-18
- Inventor: Eberhard Piehler
- Applicant: Sypro Optics GmbH
- Applicant Address: DE Jena
- Assignee: Jabil Optics Germany GmbH
- Current Assignee: Jabil Optics Germany GmbH
- Current Assignee Address: DE Jena
- Agency: Volpe and Koenig, P.C.
- Priority: DE102015105738 20150415
- Main IPC: G02B17/08
- IPC: G02B17/08 ; G02B27/09 ; G02B26/10 ; G02B3/04 ; G02B19/00 ; G02B26/08 ; G02B3/00

Abstract:
Described is an optical element and a device for generating an optical line pattern. The optical element and a device having such an optical element comprise a first optical surface and a second optical surface which comprises a plurality of cylinder-shaped partial areas which extend along a first direction (X) and are stacked along a second direction (Y). The second direction (Y) extends vertically to the first direction (X), and an optical axis (Z) extends vertically to the first direction (X) and vertically to the second direction (Y), where at least 60% of the surface of the cylinder-shaped partial areas is oriented in such a way that a normal vector arranged on the surface extends to a side facing away from the optical axis (Z) and to a side facing away from the first optical surface.
Public/Granted literature
- US20160306178A1 OPTICAL ELEMENT AND DEVICE FOR GENERATING AN OPTICAL LINE PATTERN Public/Granted day:2016-10-20
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B17/00 | 有或无折射元件的具有反射面的系统 |
G02B17/08 | .折反射系统 |