Invention Grant
- Patent Title: Illumination system for lithographic projection exposure step-and-scan apparatus
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Application No.: US14984891Application Date: 2015-12-30
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Publication No.: US09709896B2Publication Date: 2017-07-18
- Inventor: Aijun Zeng , Liqun Chen , Ruifang Fang , Huijie Huang
- Applicant: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- Applicant Address: CN Shanghai
- Assignee: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- Current Assignee: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- Current Assignee Address: CN Shanghai
- Agency: Mei & Mark LLP
- Agent Manni Li
- Priority: CN201310270245 20130701
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20

Abstract:
Illumination system for a lithographic projection exposure step-and-scan apparatus comprising a light source, a pupil shaping unit, a field defining unit, a first lens array, a first slit array, a second lens array, a third lens array, a second slit array, a fourth lens array, a condenser lens, and a scanning drive unit sequentially arranged along the light beam propagation direction. The illumination system reduces requirements on lens processing, slit scanning speed, and slit scanning precision, therefore may be implemented more easily.
Public/Granted literature
- US20160109808A1 ILLUMINATION SYSTEM FOR LITHOGRAPHIC PROJECTION EXPOSURE STEP-AND-SCAN APPARATUS Public/Granted day:2016-04-21
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