Invention Grant
- Patent Title: Non-planar radial-flow plasma treatment system
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Application No.: US14704317Application Date: 2015-05-05
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Publication No.: US09711333B2Publication Date: 2017-07-18
- Inventor: Kurt D. Sieber , Ronald Steven Cok , Gary Alan Kneezel
- Applicant: Eastman Kodak Company
- Applicant Address: US NY Rochester
- Assignee: EASTMAN KODAK COMPANY
- Current Assignee: EASTMAN KODAK COMPANY
- Current Assignee Address: US NY Rochester
- Agent David A. Novais; William R. Zimmerli
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/455 ; H05H1/24 ; H05H1/46

Abstract:
An atmospheric-pressure plasma treatment system includes a plasma source including at least one electrode, a gas in a gas chamber, and an AC power supply that supplies power to the at least one electrode to form a plasma in the gas. A radial-flow surface has a jet nozzle through which the gas flows and the radial-flow surface has a surface profile that conforms to a nonplanar treatment surface of an object. The radial-flow surface is separated from the nonplanar treatment surface by a gap that is less than 2 times a diameter of the jet nozzle so that the gas flows radially outward from the nozzle and between the radial-flow surface and the nonplanar treatment surface.
Public/Granted literature
- US20160329191A1 NON-PLANAR RADIAL-FLOW PLASMA TREATMENT SYSTEM Public/Granted day:2016-11-10
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