Invention Grant
- Patent Title: Wiring substrate and semiconductor device
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Application No.: US15298487Application Date: 2016-10-20
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Publication No.: US09711461B2Publication Date: 2017-07-18
- Inventor: Natsuko Kitajo , Yuji Yukiiri , Izumi Tanaka
- Applicant: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Applicant Address: JP
- Assignee: Shinko Electric Industries Co., Ltd.
- Current Assignee: Shinko Electric Industries Co., Ltd.
- Current Assignee Address: JP
- Agency: Tarolli, Sundheim, Covell & Tummino LLP
- Priority: JP2015-224688 20151117
- Main IPC: H01L23/04
- IPC: H01L23/04 ; H01L21/44 ; H01L23/544 ; H01L23/498

Abstract:
A wiring substrate includes first through holes extending through an insulation layer, first via wirings formed in the first through holes, a conductive pattern connected to the first via wirings, recesses formed in the first via wirings, and a protective insulation layer covering the conductive pattern and the first via wirings. The first via wirings, the conductive pattern, the recesses, and the protective insulation layer form an identification mark identifiable as a particular shape including a character or a symbol. Each recess is defined by an upper surface of the corresponding first via wiring and includes a curved side wall and a bottom wall that is located at a lower position than an upper surface of the conductive pattern. The protective insulation layer is thicker over the first via wirings than over the conductive pattern.
Public/Granted literature
- US20170141044A1 WIRING SUBSTRATE AND SEMICONDUCTOR DEVICE Public/Granted day:2017-05-18
Information query
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