Invention Grant
- Patent Title: Semiconductor device
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Application No.: US14875654Application Date: 2015-10-05
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Publication No.: US09711659B2Publication Date: 2017-07-18
- Inventor: Taichi Karino , Masaru Saito , Masaharu Yamaji , Osamu Sasaki
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kawasaki-Shi
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kawasaki-Shi
- Agency: Rabin & Berdo, P.C.
- Priority: JP2014-229696 20141112
- Main IPC: H01L29/808
- IPC: H01L29/808 ; H01L27/085 ; H02M3/335

Abstract:
A semiconductor device includes a first conductive type first main electrode region, a first conductive type drift region which makes contact with the first main electrode region, a first conductive type second main electrode region which makes contact with the drift region, a second conductive type well region which is provided in a part of a surface layer portion of the drift region and to which a reference potential is applied, and a first conductive type potential extracting region which is provided in a surface layer portion of the well region and to which the reference potential is applied. The well region serves as a base region which controls a current flowing between the potential extracting region and the drift region. Thus, it is possible to provide a novel semiconductor device which is high in reliability while the increase of the chip size can be suppressed.
Public/Granted literature
- US20160133704A1 SEMICONDUCTOR DEVICE Public/Granted day:2016-05-12
Information query
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