Invention Grant
- Patent Title: Semiconductor laser and method for manufacturing the same
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Application No.: US15218394Application Date: 2016-07-25
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Publication No.: US09711936B2Publication Date: 2017-07-18
- Inventor: Masafumi Minami , Naohisa Tamada , Takahiro Ueno , Motoshi Kitagawa
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JP2015-219162 20151109
- Main IPC: H01S5/02
- IPC: H01S5/02 ; H01S5/00

Abstract:
A method for manufacturing a semiconductor laser of the present invention includes a step of forming an insulating film on a surface of a grooved semiconductor substrate, a step of pasting an insulating sheet to a top surface of the insulating film so as to cover an opening of the groove and forming an insulating layer on the semiconductor substrate, a step of forming an opening of providing a first opening in the insulating layer so that a part corresponding to an electrode of the semiconductor substrate is exposed and a step of forming the electrode on a top surface of the insulating layer so as to fill the first opening.
Public/Granted literature
- US20170133820A1 SEMICONDUCTOR LASER AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2017-05-11
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