Invention Grant
- Patent Title: Multi charged particle beam writing apparatus, and multi charged particle beam writing method
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Application No.: US14944671Application Date: 2015-11-18
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Publication No.: US09715993B2Publication Date: 2017-07-25
- Inventor: Hideo Inoue
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-241349 20141128
- Main IPC: H01J37/317
- IPC: H01J37/317 ; H01J37/304 ; H01J37/04

Abstract:
A multi charged particle beam writing apparatus includes a deflector to collectively deflect each beam in an “on” state, by tracking control in such a way as to follow stage movement, an obtaining processing circuitry to obtain a deviation amount of an irradiation position of each beam of multi-beams depending on a tracking amount of the tracking control, a correction coefficient calculation processing circuitry to calculate a correction coefficient for correcting the deviation amount of the irradiation position depending on the tracking amount, for each beam of the multi-beams and for each irradiation position, a shot data generation processing circuitry to generate shot data where deviation of an irradiation position of each beam of multi-beams depending on a tracking amount is to be corrected using a correction coefficient, for each tracking operation, and a deflection control processing circuitry to control plural blankers, based on the shot data.
Public/Granted literature
- US20160155608A1 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI CHARGED PARTICLE BEAM WRITING METHOD Public/Granted day:2016-06-02
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