Invention Grant
- Patent Title: Composite substrate
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Application No.: US15120458Application Date: 2015-02-16
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Publication No.: US09716107B2Publication Date: 2017-07-25
- Inventor: Makoto Kawai , Shigeru Konishi
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2014-031461 20140221
- International Application: PCT/JP2015/054085 WO 20150216
- International Announcement: WO2015/125722 WO 20150827
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L21/84 ; H01L21/762 ; C30B29/06 ; C30B33/06 ; B32B9/04 ; B32B37/00 ; H01L21/768 ; H01L29/66 ; H01L29/78

Abstract:
This composite substrate has a single-crystal semiconductor thin film (13) provided to at least the front surface of an inorganic insulating sintered-body substrate (11) having a thermal conductivity of at least 5 W/m·K and a volume resistivity of at least 1×108 Ω·cm. The composite substrate also has, provided between the inorganic insulating sintered-body substrate (11) and the single-crystal semiconductor thin film (13), a silicon coating layer (12) comprising polycrystalline silicon or amorphous silicon.As a result of the present invention, metal impurity contamination from the sintered body can be inhibited, even in a composite substrate in which a single-crystal silicon thin film is provided upon an inexpensive ceramic sintered body which is opaque with respect to visible light, which exhibits an excellent thermal conductivity, and which further exhibits little loss at a high frequency range, and characteristics can be improved.
Public/Granted literature
- US20170077141A1 COMPOSITE SUBSTRATE Public/Granted day:2017-03-16
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