An imprint lithography apparatus uses a mold having a pattern formed thereon and transfers the pattern to an imprint material fed to a substrate. The apparatus includes a light-receiving element; a detection system that irradiates a mark formed on the substrate and a mark formed on the mold with light which is reflected therefrom, and guides the light reflected from the mark formed on the substrate and from the mark formed on the mold to the light-receiving element; a relay optical system that causes the light reflected to focus between the mold and the detection system; an illumination system that emits illumination light for curing the imprint material; an optical element having a surface that transmits one of the illumination light and the light from the detection system and reflects the other; and a plate-shaped optical member that corrects aberration of the relay optical system.