Invention Grant
- Patent Title: Article and active energy ray-curable resin composition
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Application No.: US14407764Application Date: 2013-06-17
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Publication No.: US09718910B2Publication Date: 2017-08-01
- Inventor: Go Otani , Seiichiro Mori , Masashi Ikawa , Yusuke Nakai , Keiko Yasukawa , Shinji Makino
- Applicant: Mitsubishi Rayon Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Rayon Co., Ltd.
- Current Assignee: Mitsubishi Rayon Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Morgan, Lewis & Bockius LLP
- Priority: JP2012-135982 20120615; JP2012-138147 20120619; JP2012-245231 20121107; JP2012-258346 20121127
- International Application: PCT/JP2013/066592 WO 20130617
- International Announcement: WO2013/187528 WO 20131219
- Main IPC: C08F222/10
- IPC: C08F222/10 ; C08F222/20 ; C08F290/06 ; C08F299/02 ; G02B1/11 ; B29C37/00 ; B29C59/04 ; G02B1/118 ; B29C35/08

Abstract:
Provided is an article having high scratch resistance and satisfactory fingerprint wipeability. Disclosed is an article having a microrelief structure containing a cured product of a resin composition on the surface, in which the indentation elastic modulus (X) [MPa] and the creep deformation ratio (Y) [%] of the cured product satisfy the following formulas (1) and (2): 80≦X≦560 (1) Y≦(0.00022X−0.01)×100 (2).
Public/Granted literature
- US20150166704A1 Article and Active Energy Ray-Curable Resin Composition Public/Granted day:2015-06-18
Information query
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