Invention Grant
- Patent Title: Directed self-assembly composition for pattern formation and pattern-forming method
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Application No.: US13923176Application Date: 2013-06-20
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Publication No.: US09718950B2Publication Date: 2017-08-01
- Inventor: Shinya Minegishi , Yuji Namie , Tomoki Nagai
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-140124 20120621
- Main IPC: C08L25/06
- IPC: C08L25/06 ; C09D133/08 ; C08L33/14 ; B05D5/00 ; G03F7/00 ; C09D133/06 ; C09D133/16 ; C08L33/16
Abstract:
A directed self-assembly composition for pattern formation, includes two or more kinds of polymers. The two or more kinds of polymers each do not have a silicon atom in a main chain thereof. At least one of the two or more kinds of polymers has a group binding to the polymerizing end of the main chain and having a hetero atom.
Public/Granted literature
- US20130344249A1 DIRECTED SELF-ASSEMBLY COMPOSITION FOR PATTERN FORMATION AND PATTERN-FORMING METHOD Public/Granted day:2013-12-26
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