Invention Grant
- Patent Title: Method for producing the growth of a semiconductor material
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Application No.: US14465875Application Date: 2014-08-22
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Publication No.: US09719187B2Publication Date: 2017-08-01
- Inventor: Sylvain Paltrier
- Applicant: Societe Francaise de Detecteurs Infrarouges-Sofradir
- Applicant Address: FR Chatenay Malabry
- Assignee: SOCIETE FRANCAISE DE DETECTEURS INFRAROUGES-SOFRADIR
- Current Assignee: SOCIETE FRANCAISE DE DETECTEURS INFRAROUGES-SOFRADIR
- Current Assignee Address: FR Chatenay Malabry
- Agency: Heslin Rothenberg Farley & Mesiti P.C.
- Priority: FR0752615 20070110
- Main IPC: C30B11/00
- IPC: C30B11/00 ; C30B29/48 ; C30B11/14 ; H01L21/02 ; C30B15/22 ; C30B29/10

Abstract:
A method for producing the growth of a semiconductor material, in particular of type II-VI, uses a melt of the semiconductor placed in a sealed bulb under vacuum or under controlled atmosphere, the bulb being subjected to a sufficient temperature gradient for first maintaining the melt in the liquid state, then causing its progressive crystallization from the surface towards the bottom. The method further comprises an element capable of floating on the surface of the melt, and equipped with a substantially central bore, intended for receiving a seed crystal for permitting the nucleation leading to the preparation of a seed crystal, and also supporting the seed crystal above the melt while maintaining it in contact with the melt in order to permit the continued crystallization from the seed crystal by lowering the temperature gradient.
Public/Granted literature
- US20140360427A1 METHOD FOR PRODUCING THE GROWTH OF A SEMICONDUCTOR MATERIAL Public/Granted day:2014-12-11
Information query
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