Invention Grant
- Patent Title: Pattern definition of nanocellulose sheets through selective ashing via lithographic masking
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Application No.: US15361171Application Date: 2016-11-25
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Publication No.: US09720318B2Publication Date: 2017-08-01
- Inventor: Michael A. Daniele , Jonathan D. Yuen
- Applicant: The United States of America, as represented by the Secretary of the Navy
- Applicant Address: US DC Washington
- Assignee: The United States of America, as represented by the Secretary of the Navy
- Current Assignee: The United States of America, as represented by the Secretary of the Navy
- Current Assignee Address: US DC Washington
- Agency: US Naval Research Laboratory
- Agent Roy Roberts
- Main IPC: B44C1/22
- IPC: B44C1/22 ; C03C15/00 ; C03C25/68 ; C23F1/00 ; G03F7/00 ; C08B1/00 ; C12P19/04 ; A61B5/00
Abstract:
A masked etching process can prepare patterned nanocellulose for use in conformal electronics such as electrodermal structures might be adhered to human skin.
Public/Granted literature
- US20170153541A1 Pattern definition of nanocellulose sheets through selective ashing via lithographic masking. Public/Granted day:2017-06-01
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