Invention Grant
- Patent Title: Lactone photoacid generators and resins and photoresists comprising same
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Application No.: US13297031Application Date: 2011-11-15
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Publication No.: US09720321B2Publication Date: 2017-08-01
- Inventor: Emad Aqad , Mingqi Li , Cheng-Bai Xu , Cong Liu
- Applicant: Emad Aqad , Mingqi Li , Cheng-Bai Xu , Cong Liu
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07D493/08 ; G03F7/039
Abstract:
New lactone-containing photoacid generator compounds (“PAGs”) and photoresist compositions that comprise each PAG compounds are provided. These photoresist compositions are useful in the manufacture of electronic device.
Public/Granted literature
- US20120129104A1 LACTONE PHOTOACID GENERATORS AND RESINS AND PHOTORESISTS COMPRISING SAME Public/Granted day:2012-05-24
Information query
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