Invention Grant
- Patent Title: Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
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Application No.: US14134417Application Date: 2013-12-19
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Publication No.: US09720331B2Publication Date: 2017-08-01
- Inventor: Shinji Sato , Kenyou Odanaka
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52 ; G03F7/20

Abstract:
A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate by exposure light via a first liquid between an emitting surface of an optical member and the substrate, and is capable of forming a liquid immersion space on an object movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member; a second member that includes at least a portion disposed below the first member, that is capable of being opposite to the object and that is movable outside an optical path of the exposure light; and a protection part that protects the optical member. The protection part decreases a change in pressure which the optical member receives from the liquid in the liquid immersion space.
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