Invention Grant
- Patent Title: Microlithographic apparatus and method of varying a light irradiance distribution
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Application No.: US14851107Application Date: 2015-09-11
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Publication No.: US09720336B2Publication Date: 2017-08-01
- Inventor: Holger Walter , Alexander Wolf
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20 ; G02B27/58

Abstract:
A microlithographic apparatus includes an objective that includes a transmission filter that is configured to variably modify a light irradiance distribution in a projection light path. The transmission filter includes a plurality of gas outlet apertures that are configured to emit gas flows that pass through a space through which projection light propagates during operation of the microlithographic apparatus. The transmission filter further includes a control unit which is configured to vary a number density of ozone molecules in the gas flows individually for each gas flow. In this manner it is possible to finally adjust the transmittance distribution of the transmission filter.
Public/Granted literature
- US20160004174A1 MICROLITHOGRAPHIC APPARATUS AND METHOD OF VARYING A LIGHT IRRADIANCE DISTRIBUTION Public/Granted day:2016-01-07
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