Invention Grant
- Patent Title: Substrate processing system, substrate processing apparatus and method for accumulating data for substrate processing apparatus
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Application No.: US14309460Application Date: 2014-06-19
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Publication No.: US09720407B2Publication Date: 2017-08-01
- Inventor: Yoshitaka Koyama , Hiroyuki Iwakura
- Applicant: Hitachi Kokusai Electric Inc.
- Applicant Address: JP Tokyo
- Assignee: Hitachi Kokusai Electric Inc.
- Current Assignee: Hitachi Kokusai Electric Inc.
- Current Assignee Address: JP Tokyo
- Agency: Volpe and Koenig, P.C.
- Priority: JP2011-278569 20111220
- Main IPC: G05B23/02
- IPC: G05B23/02 ; G06F11/30

Abstract:
A substrate processing system includes a monitored data receiving unit receiving a plurality of types of monitored data; a temporary memory unit periodically storing the monitored data; a monitored data rate detection unit detecting, as a monitored data rate, a total number of times each type of monitored data changes during a first time period by more than a predetermined amount; a monitored data writing allocation unit allocating a storing frequency to each type of monitored data based on the monitored data rate and an upper limit; a monitored data writing unit writing the monitored data to the temporary memory unit during the second time period based on the storing frequency; an accumulative memory unit storing the monitored data for a plurality of periods; and an accumulative data writing unit reading the monitored data for every third time period and storing the monitored data in the accumulative memory unit.
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