Invention Grant
- Patent Title: Embedded mask patterning process for fabricating magnetic media and other structures
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Application No.: US14422262Application Date: 2013-08-21
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Publication No.: US09721767B2Publication Date: 2017-08-01
- Inventor: Jian-Ping Wang , Hao Wang , Haibao Zhao
- Applicant: Regents of the University of Minnesota
- Applicant Address: US MN Minneapolis
- Assignee: Regents of the University of Minnesota
- Current Assignee: Regents of the University of Minnesota
- Current Assignee Address: US MN Minneapolis
- Agency: Shumaker & Sieffert, P.A.
- International Application: PCT/US2013/056031 WO 20130821
- International Announcement: WO2014/031772 WO 20140227
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/44 ; G11B5/855

Abstract:
In some examples, a method comprising depositing a functional layer (e.g., a magnetic layer) over a substrate; depositing a granular layer over the functional layer, the granular layer including a first material defining a plurality of grains separated by a second material defining grain boundaries of the plurality of grains; removing the second material from the granular layer such that the plurality of grains of the granular layer define a hard mask layer on the functional layer; and removing portions of the functional layer not masked by the hard mask layer, wherein the depositing of the functional layer, the depositing of the granular layer, removing the second material, and removing the portions of the functional layer are performed in a vacuum environment.
Public/Granted literature
- US20150221483A1 EMBEDDED MASK PATTERNING PROCESS FOR FABRICATING MAGNETIC MEDIA AND OTHER STRUCTURES Public/Granted day:2015-08-06
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