Invention Grant
- Patent Title: Wafer edge shape for thin wafer processing
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Application No.: US14945115Application Date: 2015-11-18
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Publication No.: US09721907B2Publication Date: 2017-08-01
- Inventor: Helmut Oefner , Hans-Joachim Schulze
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Dicke, Billig & Czaja, PLLC
- Main IPC: H01L29/02
- IPC: H01L29/02 ; H01L21/302 ; H01L23/00 ; H01L21/02 ; H01L21/304

Abstract:
A wafer that includes a front surface, a back surface, and an edge between the front surface and the back surface having a curved edge profile between an edge of the front surface and a side face of the edge of the wafer. The edge profile includes a first convex curve that joins the edge of the front surface, a second convex curve that joins the side face, and an intermediate concave curve that joins the first convex curve and the second convex curve.
Public/Granted literature
- US20170141049A1 Wafer Edge Shape for Thin Wafer Processing Public/Granted day:2017-05-18
Information query
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