Invention Grant
- Patent Title: Field-effect transistor stack voltage compensation
-
Application No.: US14451321Application Date: 2014-08-04
-
Publication No.: US09721936B2Publication Date: 2017-08-01
- Inventor: Yu Zhu , David Scott Whitefield , Ambarish Roy , Guillaume Alexandre Blin
- Applicant: SKYWORKS SOLUTIONS, INC.
- Applicant Address: US MA Woburn
- Assignee: Skyworks Solutions, Inc.
- Current Assignee: Skyworks Solutions, Inc.
- Current Assignee Address: US MA Woburn
- Agency: Chang & Hale LLP
- Main IPC: H01L27/088
- IPC: H01L27/088 ; H01L27/02 ; H01L27/12

Abstract:
Field-effect transistor (FET) stack voltage compensation. In some embodiments, a switching device can include a first terminal and a second terminal, and a plurality of switching elements connected in series between the first and terminal and the second terminal. Each switching element has a parameter that is configured to yield a desired voltage drop profile among the connected switching elements. Such a desired voltage drop profile can be achieved by some or all FETs in a stack having variable dimensions such as variable gate width or variable numbers of fingers associated with the gates.
Public/Granted literature
- US20150041917A1 FIELD-EFFECT TRANSISTOR STACK VOLTAGE COMPENSATION Public/Granted day:2015-02-12
Information query
IPC分类: