Super junction semiconductor device having columnar super junction regions extending into a drift layer
Abstract:
A super junction semiconductor device includes a semiconductor portion with first and second surfaces parallel to one another and including a doped layer of a first conductivity type formed at least in a cell area. Columnar first super junction regions of a second conductivity type extend in a direction perpendicular to the first surface and are separated by columnar second super junction regions of the first conductivity type. The first and second super junction regions form a super junction structure between the first surface and the doped layer. A first electrode structure directly adjoins the first surface and a second electrode structure directly adjoins the second surface. The first electrode structure has a first thickness and the second electrode structure has a second thickness. A sum of the first and second thicknesses is at least 20% of the thickness of the semiconductor portion between the first and second surfaces.
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