Invention Grant
- Patent Title: Super junction semiconductor device having columnar super junction regions extending into a drift layer
-
Application No.: US15160672Application Date: 2016-05-20
-
Publication No.: US09722020B2Publication Date: 2017-08-01
- Inventor: Armin Willmeroth , Franz Hirler , Hans-Joachim Schulze , Uwe Wahl , Winfried Kaindl
- Applicant: Infineon Technologies Austria AG
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/66 ; H01L29/78 ; H01L21/322 ; H01L29/739 ; H01L29/10 ; H01L29/417 ; H01L29/45 ; H01L29/861 ; H01L29/32 ; H01L29/08 ; H01L29/165 ; H01L21/304 ; H01L21/306

Abstract:
A super junction semiconductor device includes a semiconductor portion with first and second surfaces parallel to one another and including a doped layer of a first conductivity type formed at least in a cell area. Columnar first super junction regions of a second conductivity type extend in a direction perpendicular to the first surface and are separated by columnar second super junction regions of the first conductivity type. The first and second super junction regions form a super junction structure between the first surface and the doped layer. A first electrode structure directly adjoins the first surface and a second electrode structure directly adjoins the second surface. The first electrode structure has a first thickness and the second electrode structure has a second thickness. A sum of the first and second thicknesses is at least 20% of the thickness of the semiconductor portion between the first and second surfaces.
Public/Granted literature
- US20160268370A1 Super Junction Semiconductor Device Having Columnar Super Junction Regions and Electrode Structures Public/Granted day:2016-09-15
Information query
IPC分类: