Invention Grant
- Patent Title: Method for reviewing a defect and apparatus
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Application No.: US14799741Application Date: 2015-07-15
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Publication No.: US09733194B2Publication Date: 2017-08-15
- Inventor: Yuko Otani , Shunji Maeda , Yuta Urano , Toshifumi Honda , Takehiro Hirai , Satoru Takahashi , Kiyoshi Takamasu
- Applicant: Hitachi High-Technologies Corporation , The University of Tokyo
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: Hitachi High-Technologies Corporation,The University of Tokyo
- Current Assignee: Hitachi High-Technologies Corporation,The University of Tokyo
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2014-145199 20140715
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/88 ; G01N21/95 ; G01N21/956

Abstract:
A method for reviewing a defect including a light capturing step that illuminates a sample with light under plural optical conditions, while varying only at least one of illumination conditions, sample conditions, or detection conditions, and detects plural lights scattering from the sample; a signal obtaining step that obtains plural signals based on the lights detected; and a processing step that discriminates a defect from noise according to a waveform characteristic quantity, an image characteristic quantity, or a value characteristic quantity created using the signals and derives the coordinates of defect.
Public/Granted literature
- US20160018340A1 METHOD FOR REVIEWING A DEFECT AND APPARATUS Public/Granted day:2016-01-21
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