Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15359729Application Date: 2016-11-23
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Publication No.: US09748247B2Publication Date: 2017-08-29
- Inventor: Tohru Kawai , Masahiro Shimizu
- Applicant: Renesas Electronics Corporation
- Applicant Address: JP Koutou-ku, Tokyo
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Koutou-ku, Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2015-241692 20151211
- Main IPC: H01L27/00
- IPC: H01L27/00 ; H01L27/092 ; G11C11/419

Abstract:
A semiconductor device aims to prevent a leak current from flowing between a well and a corner of an active region formed on an upper surface of another well in an SRAM. In a memory cell of the SRAM, a load MOSFET is formed. An end of an active region extending in y-direction is arranged to gradually go away from a p-well as it goes from a gate electrode G2 side to a gate electrode G4 side in such a manner that a distance in x-direction between the end of the active region and the p-well is larger than a shortest distance in the x-direction between the p-well and the active region.
Public/Granted literature
- US20170170183A1 SEMICONDUCTOR DEVICE Public/Granted day:2017-06-15
Information query
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