Invention Grant
- Patent Title: MEMS pressure sensor with thermal compensation
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Application No.: US14711766Application Date: 2015-05-13
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Publication No.: US09751750B2Publication Date: 2017-09-05
- Inventor: Xianming Zhang , Guangcai Fu
- Applicant: Semiconductor Manufacturing International (Shanghai) Corporation
- Applicant Address: CN Shanghai
- Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
- Current Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
- Current Assignee Address: CN Shanghai
- Agency: Kilpatrick Townsend and Stockton LLP
- Priority: CN201410242793 20140603
- Main IPC: B81B3/00
- IPC: B81B3/00 ; G01L19/04 ; G01L9/12 ; G01L9/00

Abstract:
A semiconductor device having a capacitive pressure sensor structure includes a substrate, an interlayer dielectric layer on the substrate, a bottom electrode of a pressure sensor within the interlayer dielectric layer, a pressure sensing cavity above the bottom electrode, a sensing film above the pressure sensing cavity and covering a portion of the interlayer dielectric layer, a cover layer on the interlayer dielectric layer and on the sensing film, the cover layer having an opening exposing a portion of the sensing film, and a high thermal expansion coefficient material layer disposed on cover layer and sidewalls of the opening. Through the use of the high thermal expansion coefficient material layer, the capacitive pressure sensor structure is not susceptible to changes in ambient temperature to enhance the sensitivity of the capacitive pressure sensor structure.
Public/Granted literature
- US20160009546A1 MEMS PRESSURE SENSOR WITH THERMAL COMPENSATION Public/Granted day:2016-01-14
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