Invention Grant
- Patent Title: Low toxicity solvent system for polyamideimide resins and solvent system manufacture
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Application No.: US14365459Application Date: 2012-12-17
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Publication No.: US09751986B2Publication Date: 2017-09-05
- Inventor: John Sidenstick , David Noga , Kathryn Mullins , Mace Phillips
- Applicant: FUJIFILM Hunt Chemicals U.S.A., Inc.
- Applicant Address: US NJ Allendale
- Assignee: FUJIFILM HUNT CHEMICALS US, INC.
- Current Assignee: FUJIFILM HUNT CHEMICALS US, INC.
- Current Assignee Address: US NJ Allendale
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- International Application: PCT/US2012/070192 WO 20121217
- International Announcement: WO2013/090933 WO 20130620
- Main IPC: C08G73/14
- IPC: C08G73/14 ; C08G73/10 ; C09D7/00 ; C09D179/08 ; C08L79/08
Abstract:
Disclosed is a low toxicity aprotic alkyl amide solvent system used for the manufacture and application of polyamideimide resins, and an efficient method for manufacturing the polyamideimide resins in a solvent system in a single reaction with distillation which allows recycling of intermediate streams. The solvent system can be used for either the manufacture or the dissolution of polyamideimide resins.
Public/Granted literature
- US20160002408A1 LOW TOXICITY SOLVENT SYSTEM FOR POLYAMIDEIMIDE RESINS AND SOLVENT SYSTEM MANUFACTURE Public/Granted day:2016-01-07
Information query
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