Invention Grant
- Patent Title: Film deposition device
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Application No.: US14905123Application Date: 2014-06-25
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Publication No.: US09752229B2Publication Date: 2017-09-05
- Inventor: Satoshi Hirota
- Applicant: KOBE STEEL, LTD.
- Applicant Address: JP Kobe-shi
- Assignee: Kobe Steel, Ltd.
- Current Assignee: Kobe Steel, Ltd.
- Current Assignee Address: JP Kobe-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2013-163477 20130806
- International Application: PCT/JP2014/066817 WO 20140625
- International Announcement: WO2015/019730 WO 20150212
- Main IPC: C23C14/35
- IPC: C23C14/35 ; H01J37/34

Abstract:
A film deposition device including a DMS target and a film-deposition power source, being capable of pre-sputtering the target by use of the film-deposition power source. The film deposition device includes: a film deposition chamber; first and second cathodes each having a target and disposed next to each other wherein surfaces of the target face a substrate; a magnetic-field formation unit forming a magnetic field in vicinity of the target surfaces; a film-deposition power source connected to both of the cathodes; and a shutter. The shutter makes an opening-closing action between a close portion at which the shutter is interposed between the substrate and the target surfaces of both cathodes to block the target surfaces collectively from the substrate and an open position to allow film deposition on the substrate through opening the space between the target surfaces and the substrate.
Public/Granted literature
- US20160160343A1 FILM DEPOSITION DEVICE Public/Granted day:2016-06-09
Information query
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