Invention Grant
- Patent Title: Apparatus for electroless metal deposition having filter system and associated oxygen source
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Application No.: US13469607Application Date: 2012-05-11
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Publication No.: US09752231B2Publication Date: 2017-09-05
- Inventor: Shijian Li
- Applicant: Shijian Li
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Beyer Law Group LLP
- Main IPC: C23C18/16
- IPC: C23C18/16

Abstract:
One or more aspects of this invention pertain to fabrication of electronic devices. One aspect of the present invention is a system for electroless deposition of metal on a substrate. According to one or more embodiments of the present invention, the system comprises a main subsystem in combination with one or more subsystems for electroless deposition on a substrate. Another aspect of the present invention is a method of making an electronic device. According to one or more embodiments of the present invention, the method comprises one or more processes. Descriptions according to one or more embodiments of the system and the processes are presented.
Public/Granted literature
- US20130302527A1 METHODS AND APPARATUSES FOR ELECTROLESS METAL DEPOSITION Public/Granted day:2013-11-14
Information query
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