An IC design method includes: receiving a first layout including a first pattern; receiving a second layout including a second pattern, the first pattern separated from the second pattern when overlapping the first layout and the second layout; providing a cut pattern between the first pattern and the second pattern and overlapping the first pattern when overlapping the first layout, the second layout and the cut pattern; and providing a jog extending from the cut pattern to further overlap the first pattern with a length when a spacing between the second pattern and an edge of the cut pattern overlapping the first pattern is lower than a predetermined value, in which a ratio of the length of the jog to the spacing between the second pattern and the edge of the cut pattern overlapping the first pattern is in a range of 1/5 to 1/1.