Invention Grant
- Patent Title: Semiconductor device and method of fabricating the same
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Application No.: US14995830Application Date: 2016-01-14
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Publication No.: US09754936B2Publication Date: 2017-09-05
- Inventor: Suehye Park , Yoonhae Kim , Deokhan Bae , Jaeran Jang , Hwichan Jun
- Applicant: Suehye Park , Yoonhae Kim , Deokhan Bae , Jaeran Jang , Hwichan Jun
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine & Whitt, PLLC
- Priority: KR10-2015-0052551 20150414
- Main IPC: H01L27/088
- IPC: H01L27/088 ; H01L23/485

Abstract:
A semiconductor device includes a substrate provided with active patterns, gate electrodes extending across the active patterns, source/drain regions provided in upper portions of the active patterns between the gate electrodes, respectively, and first contacts and second contacts provided between the gate electrodes and electrically connected to the source/drain regions, respectively. The first and second contacts are disposed in such a way that a contact center line thereof is spaced apart from a corresponding gate center line by first and second distances. The first distance differs from the second distance.
Public/Granted literature
- US20160307837A1 SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME Public/Granted day:2016-10-20
Information query
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