Invention Grant
- Patent Title: Semiconductor devices including insulating gates and methods for fabricating the same
-
Application No.: US15000495Application Date: 2016-01-19
-
Publication No.: US09755079B2Publication Date: 2017-09-05
- Inventor: Sang-Jine Park , Keun-Hee Bai , Kyoung-Hwan Yeo , Bo-Un Yoon , Kee-Sang Kwon , Do-Hyoung Kim , Ha-Young Jeon , Seung-Seok Ha
- Applicant: Sang-Jine Park , Keun-Hee Bai , Kyoung-Hwan Yeo , Bo-Un Yoon , Kee-Sang Kwon , Do-Hyoung Kim , Ha-Young Jeon , Seung-Seok Ha
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Ward and Smith, P.A.
- Priority: KR10-2015-0025303 20150223
- Main IPC: H01L27/088
- IPC: H01L27/088 ; H01L29/78 ; H01L29/49 ; H01L29/423 ; H01L29/06 ; H01L27/092 ; H01L27/12

Abstract:
Semiconductor devices are provided including a first active fin extending in a first direction and a second active fin spaced apart from the first active fin in a second direction perpendicular to the first direction, the second active fin extending in the first direction, the second active fin having a longer side shorter than a length of a longer side of the first active fin. A first dummy gate extends in the second direction overlapping a first end of each of the first and second active fins. A first metal gate extends in the second direction intersecting the first active fin and overlapping a second end of the second active fin. A first insulating gate extends in the second direction intersecting the first active fin. The first insulating gate extends into the first active fin.
Public/Granted literature
- US20160268414A1 Semiconductor Devices Including Insulating Gates and Methods for Fabricating the Same Public/Granted day:2016-09-15
Information query
IPC分类: