Invention Grant
- Patent Title: Radiation detector manufactured by dicing a semiconductor wafer and dicing method therefor
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Application No.: US14893539Application Date: 2014-06-06
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Publication No.: US09755098B2Publication Date: 2017-09-05
- Inventor: Noriyuki Kishi , Tatsuhiro Koizumi , Hiroyuki Shiraki , Mitsuru Tamashiro , Masaya Yamamoto
- Applicant: Siemens Aktiengesellschaft
- Applicant Address: DE Munich
- Assignee: SIEMENS AKTIENGESELLSCHAFT
- Current Assignee: SIEMENS AKTIENGESELLSCHAFT
- Current Assignee Address: DE Munich
- Agency: Harness, Dickey & Pierce, PLC
- Priority: JP2013-120969 20130607
- International Application: PCT/EP2014/061891 WO 20140606
- International Announcement: WO2014/195488 WO 20141211
- Main IPC: H01L21/78
- IPC: H01L21/78 ; H01L27/146 ; H01L31/115 ; H01L21/463 ; C30B29/48 ; C30B33/06

Abstract:
An embodiment relates to a group II-VI semiconductor wafer of a radiation detector, and an embodiment relates to a method for producing same. An embodiment of the present invention provides a group II-VI semiconductor of a radiation detector enabling reduction or restriction of the edge effect (or the end surface effect) and a method for producing same. An embodiment of the present invention provides a radiation detector obtained by half-cutting or full-cutting a group II-VI semiconductor wafer having a zinc blende structure in which the wafer has a {001} plane main surface, and cut planes according to the half-cutting or full-cutting have an angle θ (≠0°) relative to the slip direction of the wafer.
Public/Granted literature
- US20160133776A1 RADIATION DETECTOR MANUFACTURED BY DICING A SEMICONDUCTOR WAFER AND DICING METHOD THEREFOR Public/Granted day:2016-05-12
Information query
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