Invention Grant
- Patent Title: Process for silicon nanowire-graphene hybrid mat
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Application No.: US15427863Application Date: 2017-02-08
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Publication No.: US09755225B2Publication Date: 2017-09-05
- Inventor: Qing Fang , Aruna Zhamu , Bor Z. Jang
- Applicant: Nanotek Instruments, Inc.
- Applicant Address: US OH Dayton
- Assignee: Nanotek Instruments, Inc.
- Current Assignee: Nanotek Instruments, Inc.
- Current Assignee Address: US OH Dayton
- Main IPC: H01M4/36
- IPC: H01M4/36 ; H01M4/04 ; H01M4/1393 ; H01M4/38 ; H01M4/583 ; H01M10/052 ; H01M4/587 ; C01B31/04 ; C01B33/021 ; H01M4/133 ; H01M4/134 ; H01M4/1395 ; H01M10/0525 ; H01M4/02

Abstract:
Disclosed is a process for producing graphene-silicon nanowire hybrid material, comprising: (A) preparing a catalyst metal-coated mixture mass, which includes mixing graphene sheets with micron or sub-micron scaled silicon particles to form a mixture and depositing a nano-scaled catalytic metal onto surfaces of the graphene sheets and/or silicon particles; and (B) exposing the catalyst metal-coated mixture mass to a high temperature environment (preferably from 300° C. to 2,000° C., more preferably from 400° C. to 1,500° C., and most preferably from 500° C. to 1,200° C.) for a period of time sufficient to enable a catalytic metal-catalyzed growth of multiple silicon nanowires using the silicon particles as a feed material to form the graphene-silicon nanowire hybrid material composition. An optional etching or separating procedure may be conducted to remove catalytic metal or graphene from the Si nanowires.
Public/Granted literature
- US20170149054A1 PROCESS FOR SILICON NANOWIRE-GRAPHENE HYBRID MAT Public/Granted day:2017-05-25
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