Invention Grant
- Patent Title: Liquid jet apparatus and method for manufacturing liquid jet apparatus
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Application No.: US14757493Application Date: 2015-12-23
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Publication No.: US09757943B2Publication Date: 2017-09-12
- Inventor: Toru Kakiuchi
- Applicant: Brother Kogyo Kabushiki Kaisha
- Applicant Address: JP Nagoya-shi, Aichi-ken
- Assignee: Brother Kogyo Kabushiki Kaisha
- Current Assignee: Brother Kogyo Kabushiki Kaisha
- Current Assignee Address: JP Nagoya-shi, Aichi-ken
- Agency: Banner & Witcoff, Ltd.
- Priority: JP2014-264176 20141226
- Main IPC: B41J2/045
- IPC: B41J2/045 ; B41J2/14 ; B41J2/16

Abstract:
There is provided a liquid jet apparatus including a channel substrate having a plurality of pressure chambers and a film covering the plurality of pressure chambers, a piezoelectric layer, a plurality of individual electrodes, a common electrode, and a trace extending from one of the plurality of individual electrodes to pass through between two adjacent individual electrodes of the plurality of individual electrodes. An opening of the piezoelectric layer is provided between the two adjacent individual electrodes, and a metallic film is formed to cover the trace in such an area of the trace as to overlap with the opening positioned between the two adjacent individual electrodes.
Public/Granted literature
- US20160185115A1 Liquid jet apparatus and method for manufacturing liquid jet apparatus Public/Granted day:2016-06-30
Information query
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