Invention Grant
- Patent Title: Compound, resin, resist composition and method for producing resist pattern
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Application No.: US14835344Application Date: 2015-08-25
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Publication No.: US09758466B2Publication Date: 2017-09-12
- Inventor: Mitsuyoshi Ochiai , Masahiko Shimada , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2014-170798 20140825
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08F122/10 ; C08F220/22 ; C08F220/28 ; C08F220/68 ; C08F222/10 ; C08F122/18 ; C07C69/75 ; G03F7/038 ; G03F7/16 ; G03F7/20 ; G03F7/38 ; G03F7/32 ; G03F7/039 ; C07C69/753 ; C07C69/757
Abstract:
A compound having a group represented by formula (Ia): wherein R1 and R2 each independently represent a C1 to C8 fluorinated alkyl group, ring W represents a C5 to C18 alicyclic hydrocarbon group that may have a substituent, and * represents a binding site.
Public/Granted literature
- US20160052859A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2016-02-25
Information query
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