Invention Grant
- Patent Title: Acid-labile hyperbranched copolymer and associated photoresist composition and method of forming an electronic device
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Application No.: US14974329Application Date: 2015-12-18
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Publication No.: US09758610B2Publication Date: 2017-09-12
- Inventor: John W. Kramer
- Applicant: DOW Global Technologies LLC
- Applicant Address: US MI Midland
- Assignee: DOW GLOBAL TECHNOLOGIES LLC
- Current Assignee: DOW GLOBAL TECHNOLOGIES LLC
- Current Assignee Address: US MI Midland
- Agency: Cantor Colburn LLP
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08F220/18 ; C08F224/00 ; G03F7/20 ; G03F7/32 ; G03F7/039 ; C08F222/10 ; C08F220/28
Abstract:
An acid-labile hyperbranched copolymer is formed by copolymerizing monomers that include a difunctional monomer and a mono(meth)acrylate ester. The difunctional monomer includes at least one formal group, acetal group, or ketal group that makes the copolymer acid-labile. The copolymer is useful as a component of a photoresist composition that provides low line width roughness, among other desirable photolithographic properties.
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