Invention Grant
- Patent Title: Photo-patternable gate dielectrics for OFET
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Application No.: US15066548Application Date: 2016-03-10
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Publication No.: US09761817B2Publication Date: 2017-09-12
- Inventor: Robert Alan Bellman , Mingqian He , Timothy Edward Myers , Weijun Niu , David Neal Schissel , Kristi Lynn Simonton , Arthur Lawrence Wallace
- Applicant: CORNING INCORPORATED
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Main IPC: H01L51/05
- IPC: H01L51/05 ; H01L51/10 ; H01L51/00
Abstract:
Articles utilizing polymeric dielectric materials for gate dielectrics and insulator materials are provided along with methods for making the articles. The articles are useful in electronics-based devices that utilize organic thin film transistors.
Public/Granted literature
- US20160268525A1 PHOTO-PATTERNABLE GATE DIELECTRICS FOR OFET Public/Granted day:2016-09-15
Information query
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