Invention Grant
- Patent Title: Selective segment via plating process and structure
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Application No.: US14834180Application Date: 2015-08-24
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Publication No.: US09763327B2Publication Date: 2017-09-12
- Inventor: Kwan Pen , Pui Yin Yu
- Applicant: Multek Technologies Ltd.
- Applicant Address: US CA San Jose
- Assignee: Multek Technologies Limited
- Current Assignee: Multek Technologies Limited
- Current Assignee Address: US CA San Jose
- Agency: Haverstock & Owens LLP
- Priority: CN201510121886 20150319; CN201510127856 20150323
- Main IPC: H05K1/11
- IPC: H05K1/11 ; H05K1/02 ; H05K3/42 ; H05K3/46 ; H05K3/00 ; H05K3/06 ; H05K3/18

Abstract:
A selective segment via plating process for manufacturing a circuit board selectively interconnects inner conductive layers as separate segments within the same via. Plating resist is plugged into an inner core through hole and then stripped off after an electroless plating process. Stripping of the electroless plating on the plating resist results in a plating discontinuity on the via wall. In a subsequent electroplating process, the inner core layer can not be plated due to the plating discontinuity. The resulting circuit board structure has separate electrically interconnected segments within the via.
Public/Granted literature
- US20160278207A1 SELECTIVE SEGMENT VIA PLATING PROCESS AND STRUCTURE Public/Granted day:2016-09-22
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