Invention Grant
- Patent Title: Multi-laser system and method for cutting and post-cut processing hard dielectric materials
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Application No.: US14838809Application Date: 2015-08-28
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Publication No.: US09764427B2Publication Date: 2017-09-19
- Inventor: Jeffrey P. Sercel , Marco Mendes , Rouzbeh Sarrafi , Joshua Schoenly , Xiangyang Song , Mathew Hannon , Miroslaw Sokol
- Applicant: IPG Photonics Corporation
- Applicant Address: US MA Oxford
- Assignee: IPG Photonics Corporation
- Current Assignee: IPG Photonics Corporation
- Current Assignee Address: US MA Oxford
- Agency: Grossman Tucker Perreault & Pfleger, PLLC
- Main IPC: B23K26/40
- IPC: B23K26/40 ; B23K26/38 ; B23K26/402 ; C03B33/02 ; B23K26/70 ; B23K103/00

Abstract:
Laser processing of hard dielectric materials may include cutting a part from a hard dielectric material using a continuous wave laser operating in a quasi-continuous wave (QCW) mode to emit consecutive laser light pulses in a wavelength range of about 1060 nm to 1070 nm. Cutting using a QCW laser may be performed with a lower duty cycle (e.g., between about 1% and 15%) and in an inert gas atmosphere such as nitrogen, argon or helium. Laser processing of hard dielectric materials may further include post-cut processing the cut edges of the part cut from the dielectric material, for example, by beveling and/or polishing the edges to reduce edge defects. The post-cut processing may be performed using a laser beam with different laser parameters than the beam used for cutting, for example, by using a shorter wavelength (e.g., 193 nm excimer laser) and/or a shorter pulse width (e.g., picosecond laser).
Public/Granted literature
- US20160059349A1 MULTI-LASER SYSTEM AND METHOD FOR CUTTING AND POST-CUT PROCESSING HARD DIELECTRIC MATERIALS Public/Granted day:2016-03-03
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